(1) Patigul Nurmamat, Ablat Abliz*, Rational Design of Different Ga Content Bilayer InGaZnO Thin-Film Transistors With Al2O3HfO2 Passivation Layer, IEEE Transactions on Electron Devices, 71 (2024) 3032-3038. (2) Zhenyu Han, Jiajun Han, Ablat Abliz*, Enhanced electrical performance of InGaSnO thin-film transistors by designing a dual-active-layer structure”, Applied Surface Science, 648 (2024) 158995. (3) Jiajun Han, Qingfeng He, Ablat Abliz*, Fabrication and investigation of the electrical performance of nitrogenated bilayer ZnONZnO thin-film transistors, Chinese Journal of Physics, 85 (2023) 318-325. (4) Ablat Abliz*, Patigul Nurmamat, Da Wan,“Rational design of oxide heterostructure InGaZnOTiO2 for high-performance thin-film transistors”, Applied Surface Science, 609 (2023) 155257. (5) Jiajun Han , Ablat Abliz*, Da Wan* “Impact of hydrogen plasma treatment on the electrical performances of ZnO thin-film transistors”, Chinese Journal of Physics, 77 (2022)327-334. (6) Ablat Abliz*, X. Xue, X. Liu*, G. Li, L. Tang, “Rational design of hydrogen and nitrogen co-doped ZnO for high performance thin-film transistors”, Applied Physics Letters, 118 ( 2021) 123504. (7) Ablat Abliz*, “Hydrogenation of Mg-Doped InGaZnO Thin-Film Transistors for Enhanced Electrical Performance and Stability”, IEEE Transactions on Electron Devices, 68 (2021) 3379-3383. (8) Ablat Abliz*, A. Rusul*, H. Duan, A. Maimaiti, L. Yang, M. Zhang, Z. Yang “Investigation of the electrical properties and stability of HfInZnO thin-film transistors”, Chinese Journal of Physics, 68 (2020)788-795. (9) Ablat Abliz*, D. Wan*, H. Duana, L. Xu “Low-frequency noise in high performances and stability of Li-doped ZnO thin-film transistors”, Journal of Physics D Applied Physics, 53 (2020) 415110. (10) Ablat Abliz*, “Effects of hydrogen plasma treatment on the electrical performances and reliability of InGaZnO thin-film transistors ”, Journal of Alloys and Compounds, 831 (2020) 154694. (11) Ablat Abliz, L. Xu*, H. Duan, J. Wang, S. Luo, C. Liu*, “Effects of yttrium doping on the electrical performances and stability of ZnO thin-film transistors”, Applied Surface Science, 475 (2019) 565-570. (12) Ablat Abliz*, D. Wan, L. Xu, H. Duan*, “Investigation on the electrical performances and stability of W-doped ZnO thin-film transistors”, Materials Science in Semiconductor Processing, 95 (2019) 54-58. (13) Ablat Abliz, D. Wan, Y. Yang*, H. Duan, L. Liao*,“Enhanced reliability of InGaZnO thin film transistors through design of dual passivation layer”, IEEE Transactions on Electron Devices, 65 (2018) 2844-2849. (14) Ablat Abliz, Q. Gao, D. Wan, X. Liu, L. Xu, L. Liao*, C. Liu*, C. Jiang, X. Li, H. Chen, T. Guo, “Effects of nitrogen and hydrogen co-doping on the electrical performance and reliability of InGaZnO thin film transistors”, ACS Appl. Mater. Interfaces, 9 (2017) 10798-10804. (15) Ablat Abliz, C.-W. Huang, J. Wang, L. Xu, L. Liao*, X. Xiao, W.-W. Wu, Z. Fan, C. Jiang, J. Li, S. Guo, C. Liu, T. Guo, “Rational design of ZnOHZnO bilayer structure for high performance thin film transistors”, ACS Appl. Mater. Interfaces, 8 (2016) 7862-7868. (16) Ablat Abliz, J. Wang, L. Xu, D. Wan, L. Liao*, “Boost up the electrical performance of InGaZnO thin film transistors by inserting an ultrathin InGaZnOH layer”, Applied Physics Letters,108 (2016) 213501. |